Journalartikel

Chemical diffusion of copper in lead telluride


AutorenlisteSchneider, C; Schichtel, P; Mogwitz, B; Rohnke, M; Janek, J

Jahr der Veröffentlichung2017

Seiten119-125

ZeitschriftSolid State Ionics

Bandnummer303

ISSN0167-2738

DOI Linkhttps://doi.org/10.1016/j.ssi.2017.02.012

VerlagElsevier


Abstract
Within thermoelectric generators, the chemical diffusion of a contact
material into the active thermoelectric material is a potential cause
for degradation, which has rarely been discussed in literature.
Frequently, this degradation phenomenon leads to major problems in
developing new modules and achieving long-term stability. In this study,
copper as one of the standard contact materials and lead telluride as
the state-of-the-art active material in the mid-temperature range are
investigated. Chemical diffusion experiments of copper in lead telluride
were carried out between 375 K and 795 K and the copper diffusion
profiles were obtained by Secondary Ion Mass Spectrometry (SIMS). The
evaluated chemical diffusion coefficient is lower than 10−13 cm2/s in the respective temperature range.




Autoren/Herausgeber




Zitierstile

Harvard-ZitierstilSchneider, C., Schichtel, P., Mogwitz, B., Rohnke, M. and Janek, J. (2017) Chemical diffusion of copper in lead telluride, Solid State Ionics, 303, pp. 119-125. https://doi.org/10.1016/j.ssi.2017.02.012

APA-ZitierstilSchneider, C., Schichtel, P., Mogwitz, B., Rohnke, M., & Janek, J. (2017). Chemical diffusion of copper in lead telluride. Solid State Ionics. 303, 119-125. https://doi.org/10.1016/j.ssi.2017.02.012



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