Journalartikel

Jahr der Veröffentlichung: 2005

Seiten: 666-677

Zeitschrift: Physical Chemistry Chemical Physics

Bandnummer: 7

Heftnummer: 4

ISSN: 1463-9076

eISSN: 1463-9084

DOI Link: https://doi.org/10.1039/b414567d

Verlag: Royal Society of Chemistry

Abstract: 
Experiments on the generation of non-equilibrium surface patterns on ion-conducting thin films (AgCl, silver chloride) during field-driven growth in chlorine rf plasmas are reported. The growth experiments are performed in a vacuum flow reactor in the temperature range between 320 K and 450 K, at chlorine gas pressures in the order of 100 Pa, and by applying current densities in the order of 1 mA cm(-2). The surface morphology of product films is documented by scanning electron microscopy and analysed in terms of typical surface patterns. A large variety of different surface morphologies ( often finger-like or dendritic) is prepared with a high lateral uniformity and good reproducibility. A theoretical stability criterion is derived on the basis of a linear stability analysis. The model-type experiments confirm this formal stability criterion: ( a) The growth of the product surface is morphologically stable, if the plasma exhibits a higher conductivity than the growing solid. (b) The typical wavelength of the surface patterns that are formed during growth is proportional to the reciprocal root of the electric current. ( c) The periodicity of the surface patterns decreases when the temperature is increased, and the growth rate of a surface instability grows with increasing temperature. All theoretical predictions are confirmed by corresponding experimental results.

Harvard-Zitierstil: Vennekamp, M. and Janek, J. (2005) Control of the surface morphology of solid electrolyte films during field-driven growth in a reactive plasma, Physical Chemistry Chemical Physics, 7(4), pp. 666-677. https://doi.org/10.1039/b414567d

APA-Zitierstil: Vennekamp, M., & Janek, J. (2005). Control of the surface morphology of solid electrolyte films during field-driven growth in a reactive plasma. Physical Chemistry Chemical Physics. 7(4), 666-677. https://doi.org/10.1039/b414567d