Journal article

Publication year: 2008

Pages: 10423-10427

Journal: Journal of Physical Chemistry C

Volume number: 112

Issue number: 28

DOI Link: https://doi.org/10.1021/jp802359u

Publisher: American Chemical Society

Abstract: 

The stability of the recently discovered h-BN/Ru(0001) nanomesh is of crucial importance for potential applications as a nanotemplate. In particular, thermal stability in oxygen environment is important for nanocatalysis applications. We report here on the etching experiments of the h-BN layer by molecular oxygen exposure at elevated temperatures. This process is studied both by scanning tunneling microscopy (STM) on a microscopic scale and with in situ low energy electron microscopy (LEEM) on the mesoscopic scale. Temperature thresholds are determined for the microscopic (600 °C) and the mesoscopic (750 °C) etching processes for O2 pressures up to 1 × 10−6 mbar. Submonolayer amounts of Au deposited on the h-BN/Ru(0001) nanomesh improve considerably the stability of the h-BN nanomesh against etching by O2.

Harvard Citation style: Goriachko, A., Zakharov, A. and Over, H. (2008) Oxygen-Etching of h-BN/Ru(0001) Nanomesh on the Nano- and Mesoscopic Scale, Journal of Physical Chemistry C, 112(28), pp. 10423-10427. https://doi.org/10.1021/jp802359u

APA Citation style: Goriachko, A., Zakharov, A., & Over, H. (2008). Oxygen-Etching of h-BN/Ru(0001) Nanomesh on the Nano- and Mesoscopic Scale. Journal of Physical Chemistry C. 112(28), 10423-10427. https://doi.org/10.1021/jp802359u