Journalartikel

The Trifluoromethyl Sulfinyl and Oxathiyl Radicals


AutorenlisteWu, Z; Xu, J; Deng, G; Chu, X; Sokolenko, L; Trabelsi, T; Franciso, JS; Eckhardt, AK; Schreiner, PR

Jahr der Veröffentlichung2018

Seiten1505-1508

ZeitschriftChemistry - A European Journal

Bandnummer24

Heftnummer7

DOI Linkhttps://doi.org/10.1002/chem.201705142

VerlagWiley


Abstract

Two hitherto unreported sulfur‐centered radicals CF3SO. and CF3OS. were generated in the gas phase through high‐vacuum flash pyrolyses of sulfoxide CF3S(O)X (X=CF3, Cl, PhO) precursors. The CF3OS.
molecule is the first experimental example that constitutes an oxathiyl
radical. It was isolated and characterized by combining
matrix‐isolation IR and UV/Vis spectroscopy with quantum chemical
computations up to the UCCSD(T)‐F12/cc‐pVTZ‐F12 level of theory. Upon UV
light irradiation (254 or 266 nm), sulfinyl radical (CF3SO.) isomerizes to oxathiyl radical (CF3OS.)
in cryogenic noble gas matrices (Ar and Ne). Natural population
analyses at the BP86/def2‐TZVPP//UCCSD(T)‐F12/cc‐pVTZ‐F12 level suggest
that the spin density in CF3OS. is mainly localized on the sulfur atom (0.86), whereas, in CF3SO. the spin density is almost equally distributed on the sulfur (0.55) and oxygen (0.43) atoms.




Zitierstile

Harvard-ZitierstilWu, Z., Xu, J., Deng, G., Chu, X., Sokolenko, L., Trabelsi, T., et al. (2018) The Trifluoromethyl Sulfinyl and Oxathiyl Radicals, Chemistry - A European Journal, 24(7), pp. 1505-1508. https://doi.org/10.1002/chem.201705142

APA-ZitierstilWu, Z., Xu, J., Deng, G., Chu, X., Sokolenko, L., Trabelsi, T., Franciso, J., Eckhardt, A., & Schreiner, P. (2018). The Trifluoromethyl Sulfinyl and Oxathiyl Radicals. Chemistry - A European Journal. 24(7), 1505-1508. https://doi.org/10.1002/chem.201705142



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