Journalartikel

Jahr der Veröffentlichung: 2017

Seiten: 1489-1495

Zeitschrift: Nano Letters

Bandnummer: 17

Heftnummer: 3

ISSN: 1530-6984

Open Access Status: Green

DOI Link: https://doi.org/10.1021/acs.nanolett.6b04543

Verlag: American Chemical Society

Abstract: 

Color center-containing nanodiamonds have many applications in quantum
technologies and biology. Diamondoids, molecular-sized diamonds have
been used as seeds in chemical vapor deposition (CVD) growth. However,
optimizing growth conditions to produce high crystal quality
nanodiamonds with color centers requires varying growth conditions that
often leads to ad-hoc and time-consuming, one-at-a-time testing of
reaction conditions. In order to rapidly explore parameter space, we
developed a microwave plasma CVD technique using a vertical, rather than
horizontally oriented stage-substrate geometry. With this
configuration, temperature, plasma density, and atomic hydrogen density
vary continuously along the vertical axis of the substrate. This
variation allowed rapid identification of growth parameters that yield
single crystal diamonds down to 10 nm in size and 75 nm diameter
optically active center silicon-vacancy (Si-V) nanoparticles.
Furthermore, this method may provide a means of incorporating a wide
variety of dopants in nanodiamonds without ion irradiation damage.

Harvard-Zitierstil: Tzeng, Y., Zhang, J., Lu, H., Ishiwata, H., Dahl, J., Carlson, R., et al. (2017) Vertical-Substrate MPCVD Epitaxial Nanodiamond Growth, Nano Letters, 17(3), pp. 1489-1495. https://doi.org/10.1021/acs.nanolett.6b04543

APA-Zitierstil: Tzeng, Y., Zhang, J., Lu, H., Ishiwata, H., Dahl, J., Carlson, R., Yan, H., Schreiner, P., Vukovic, J., Shen, Z., Melosh, N., & Chu, S. (2017). Vertical-Substrate MPCVD Epitaxial Nanodiamond Growth. Nano Letters. 17(3), 1489-1495. https://doi.org/10.1021/acs.nanolett.6b04543