Journal article

Publication year: 2006

Pages: 34706-

Journal: The Journal of Chemical Physics

Volume number: 124

Issue number: 3

ISSN: 0021-9606

Open access status: Green

DOI Link: https://doi.org/10.1063/1.2159489

Publisher: American Institute of Physics

Abstract: 
Ultrathin rhodium films with a thickness ranging from 1 to a few monolayers were deposited on a single-crystal Ru(0001) surface in order to investigate the oxidation behavior of ultrathin epitaxial films on a dissimilar substrate. It is found that rhodium grows on Ru(0001) initially layer by layer, adapting the in-plane lattice parameters of Ru(0001). When exposing Rh films to oxygen environment (similar to 4.8x10(6) L O-2 exposure) at 660 K, 2-4 ML Rh films form a surface oxide composed of (9x9) O-Rh-O trilayers. Quite in contrast, oxidation of the 1 ML Rh/Ru(0001) film leads to a poorly ordered oxide with a rutile structure reminiscent of RuO2(110) on Ru(0001). The oxidized 1 ML Rh/Ru(0001) film contains much more oxygen than the oxidized thicker Rh films. Lower temperatures (535 K) and high doses of oxygen lead to a (1x1)-O overlayer on the 1 ML Rh/Ru(0001) surface, whose atomic geometry resembles closely that of the (1x1)-O phase on clean Ru(0001). (c) 2006 American Institute of Physics.

Harvard Citation style: He, Y., Seitsonen, A. and Over, H. (2006) Ultrathin Rh films on Ru(0001): Oxidation in confinement, The Journal of Chemical Physics, 124(3), p. 34706. https://doi.org/10.1063/1.2159489

APA Citation style: He, Y., Seitsonen, A., & Over, H. (2006). Ultrathin Rh films on Ru(0001): Oxidation in confinement. The Journal of Chemical Physics. 124(3), 34706. https://doi.org/10.1063/1.2159489