Journalartikel
Autorenliste: Whang, KW; Lee, TH; Cheong, HW; Steinmüller, SO; Janek, J
Jahr der Veröffentlichung: 2011
Seiten: 505-507
Zeitschrift: SID Symposium Digest of Technical Papers
Bandnummer: 42
Heftnummer: 1
ISSN: 2168-0159
eISSN: 2168-0159
DOI Link: https://doi.org/10.1889/1.3621368
Verlag: Wiley: No OnlineOpen
In this paper, it will be shown that we can reduce the driving voltage and improve the luminance and luminous efficacy of Plasma Display Panel(PDP) significantly by blocking the diffusion of impurities into the cathode layer which occurs during the high temperature process like panel assembly. The TOF-SIMS(Time-of-Flight Secondary Ion Mass Spectrometry) results show that the diffusion of impurities like Al, Na and K into the cathode layer can be effectively prevented by the adoption of a blocking layer made of SiO2. Another beneficial effect is the significant reduction of the aging time. It has been confirmed through the panel experiment that the impurity diffusion barrier is effective in reducing the voltage, aging time and increasing the luminous efficacy for both of the PDPs with a single MgO and a SrO-MgO double cathode layer with more spectacular improvements in the latter case.
Abstract:
Zitierstile
Harvard-Zitierstil: Whang, K., Lee, T., Cheong, H., Steinmüller, S. and Janek, J. (2011) Invited Paper: The Role of the Impurity Diffusion Barrier for the Cathode Material in AC PDP, SID Symposium Digest of Technical Papers, 42(1), pp. 505-507. https://doi.org/10.1889/1.3621368
APA-Zitierstil: Whang, K., Lee, T., Cheong, H., Steinmüller, S., & Janek, J. (2011). Invited Paper: The Role of the Impurity Diffusion Barrier for the Cathode Material in AC PDP. SID Symposium Digest of Technical Papers. 42(1), 505-507. https://doi.org/10.1889/1.3621368