Evaporation-induced self-assembly (EISA) at its limit : Ultrathin, crystalline patterns by templating of micellar monolayers - Forschungsportal der Justus-Liebig-Universität Gießen:

Journalartikel

Evaporation-induced self-assembly (EISA) at its limit : Ultrathin, crystalline patterns by templating of micellar monolayers

Autorenliste: Brezesinski, T; Groenewolt, M; Gibaud, A; Pinna, N; Antonietti, M; Smarsly, BM

Jahr der Veröffentlichung: 2006

Seiten: 2260-2263

Zeitschrift: Advanced Materials

Bandnummer: 18

Heftnummer: 17

ISSN: 0935-9648

DOI Link: https://doi.org/10.1002/adma.200600258

Verlag: Wiley

Abstract:
Ultrathin, highly crystalline, mesostructured metal oxide layers, as shown in the figure, have been prepared by sol-gel processing using a modified evaporation-induced self-assembly (EISA) approach. This approach can be exploited for the generation of periodic surface structures featuring a well-defined in-plane mesostructure and a high crystallinity at the same time.

Autoren/Herausgeber

- Uni.-Prof. Dr. Bernd Michael Smarsly

Zitierstile

Harvard-Zitierstil: Brezesinski, T., Groenewolt, M., Gibaud, A., Pinna, N., Antonietti, M. and Smarsly, B. (2006) Evaporation-induced self-assembly (EISA) at its limit : Ultrathin, crystalline patterns by templating of micellar monolayers, Advanced Materials, 18(17), pp. 2260-2263. https://doi.org/10.1002/adma.200600258

APA-Zitierstil: Brezesinski, T., Groenewolt, M., Gibaud, A., Pinna, N., Antonietti, M., & Smarsly, B. (2006). Evaporation-induced self-assembly (EISA) at its limit : Ultrathin, crystalline patterns by templating of micellar monolayers. Advanced Materials. 18(17), 2260-2263. https://doi.org/10.1002/adma.200600258