Journalartikel

Jahr der Veröffentlichung: 2020

Zeitschrift: Contributions to Plasma Physics

Bandnummer: 60

Heftnummer: 2

ISSN: 0863-1042

eISSN: 1521-3986

Open Access Status: Hybrid

DOI Link: https://doi.org/10.1002/ctpp.201900137

Verlag: Wiley-VCH Verlag

Abstract: 
The characteristics of the virtual cathode and its potential profile in the presence of negatively charged dust particles have been reported by Rathod et al. They have studied the role of charged dust particles in the formation of virtual cathode near the emitting surface. Two conditions of the dust charge number, Z(d) = 1 and Z(d) = 1,000 are used to study the role of dust density (n(d)) for the formation of virtual cathode. This work is original and will be more interesting in case of using the correct model equations and realistic dusty plasma conditions.

Harvard-Zitierstil: Choudhary, M. (2020) Comment on "Potential profile near the virtual cathode in presence of charged dust", Contributions to Plasma Physics, 60(2), Article e201900137. https://doi.org/10.1002/ctpp.201900137

APA-Zitierstil: Choudhary, M. (2020). Comment on "Potential profile near the virtual cathode in presence of charged dust". Contributions to Plasma Physics. 60(2), Article e201900137. https://doi.org/10.1002/ctpp.201900137