Journal article

Publication year: 2019

Pages: 1-9

Journal: Journal of Crystal Growth

Volume number: 516

ISSN: 0022-0248

eISSN: 1873-5002

DOI Link: https://doi.org/10.1016/j.jcrysgro.2019.03.013

Publisher: Elsevier

Abstract: 
Silicon nitride is commonly used as a coating material for the silica crucibles utilized for the growth of multi-crystalline silicon by directional solidification. The coating material might introduce impurities into the silicon melt during the growth. To investigate the wetting and incorporation behavior of the silicon nitride particles, silicon nitride particles were put intentionally into silicon rods, which were then grown by the float zone technique. To ensure that the particles stay within the melt and are not pushed out of the molten zone, the particles must show good wetting. Superheating the silicon nitride powders up to 105 K over the melting point of silicon was a successful approach to ensure wetting and thus to investigate the incorporation behavior of the silicon nitride in photovoltaic silicon. The heat treated silicon nitride particles stayed within the melt zone during the float zone experiments and the distribution behavior of the particles could be studied. Incidentally, the results imply that to suppress incorporation of silicon nitride particles (as coating material) into molten silicon during directional solidification, superheating the melt must be avoided.

Harvard Citation style: Yasseri, M., Jauss, T., Sorgenfrei, T. and Croell, A. (2019) An investigation of the wetting behavior of heat-treated silicon nitride particles with liquid silicon, Journal of Crystal Growth, 516, pp. 1-9. https://doi.org/10.1016/j.jcrysgro.2019.03.013

APA Citation style: Yasseri, M., Jauss, T., Sorgenfrei, T., & Croell, A. (2019). An investigation of the wetting behavior of heat-treated silicon nitride particles with liquid silicon. Journal of Crystal Growth. 516, 1-9. https://doi.org/10.1016/j.jcrysgro.2019.03.013