Journalartikel

Effect of boron localized states on the conduction band transport in BxGa1-xP


AutorenlistePetznick, S.; Ostheim, L.; Klar, P. J.; Liebich, S.; Volz, K.; Stolz, W.

Jahr der Veröffentlichung2014

ZeitschriftApplied Physics Letters

Bandnummer105

Heftnummer22

ISSN0003-6951

eISSN1077-3118

DOI Linkhttps://doi.org/10.1063/1.4903244

VerlagAmerican Institute of Physics


Abstract
We study the magnetotransport properties of an n-type (B, Ga) P:Te alloy and an n-type GaP:Te reference under hydrostatic pressure up to 17 kilobars in the temperature range from 1.5 to 300 K. The free carrier concentration and the mobility of the reference sample are almost independent of the applied hydrostatic pressure at room temperature. In contrast, the free carrier concentration as well as the mobility in the B0.012Ga0.988P: Te alloy increase by about 30% over the accessible pressure range. The observations are explained by assuming that a boron-related density of localized states exists in the vicinity of the conduction band edge of the alloy. These boron states act as electron traps as well as efficient scatter centers. Applying hydrostatic pressure shifts the energetic positions of conduction band edge at the X-point (where the electron transport takes place) and of the boron states apart reducing the impact of boron on the electronic transport properties of the alloy. (C) 2014 AIP Publishing LLC.



Zitierstile

Harvard-ZitierstilPetznick, S., Ostheim, L., Klar, P., Liebich, S., Volz, K. and Stolz, W. (2014) Effect of boron localized states on the conduction band transport in BxGa1-xP, Applied Physics Letters, 105(22), Article 222105. https://doi.org/10.1063/1.4903244

APA-ZitierstilPetznick, S., Ostheim, L., Klar, P., Liebich, S., Volz, K., & Stolz, W. (2014). Effect of boron localized states on the conduction band transport in BxGa1-xP. Applied Physics Letters. 105(22), Article 222105. https://doi.org/10.1063/1.4903244



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