Conference paper

Quasi-epitaxial growth of thick CuInS2 films by RF reactive sputtering with a thin epilayer buffer


Authors listHe, YB; Krost, A; Bläsing, J; Kriegseis, W; Polity, A; Meyer, BK; Kisielowski, C

Publication year2004

Pages229-232

JournalThin Solid Films

Volume number451

ISSN0040-6090

DOI Linkhttps://doi.org/10.1016/j.tsf.2003.10.100

ConferenceSymposium on Thin Film and Nano-Structured Materials for Photovoltaics

PublisherElsevier


Abstract
We demonstrate the deposition of CuInS2 films on single-crystalline (0001)-sapphire by radio frequency reactive sputtering with a Cu-In alloy target and H2S gas. X-ray diffraction (XRD) revealed that the as-sputtered films are of mainly (112)oriented CuInS2 incorporating a minor Culn, phase. XRD rocking curve of CuInS2 (112) showed a full width at half maximum of 0.1degrees, indicating an epitaxial-like growth of (112)-CuInS2 films on (0001)-sapphire. Six peaks dominantly show up in the XRD phi-20 map, between which there are additional regular modulations present, suggesting a multi-domain structure of the thick double-layered films. Furthermore, the morphology and internal microstructure of the quasi-epitaxially sputtered CuInS2 films were characterized by scanning electron microscopy and transmission electron microscopy, respectively. (C) 2003 Elsevier B.V. All rights reserved.



Citation Styles

Harvard Citation styleHe, Y., Krost, A., Bläsing, J., Kriegseis, W., Polity, A., Meyer, B., et al. (2004) Quasi-epitaxial growth of thick CuInS2 films by RF reactive sputtering with a thin epilayer buffer, Thin Solid Films, 451, pp. 229-232. https://doi.org/10.1016/j.tsf.2003.10.100

APA Citation styleHe, Y., Krost, A., Bläsing, J., Kriegseis, W., Polity, A., Meyer, B., & Kisielowski, C. (2004). Quasi-epitaxial growth of thick CuInS2 films by RF reactive sputtering with a thin epilayer buffer. Thin Solid Films. 451, 229-232. https://doi.org/10.1016/j.tsf.2003.10.100



Keywords


CuInS2 filmsquasi-epitaxial growthRF reactive sputteringSAPPHIRESI(111)SOLAR-CELLS

Last updated on 2025-02-04 at 04:10