Journal article

(001)-textured Cu2S thin films deposited by RF reactive sputtering


Authors listHe, YB; Kriegseis, W; Bläsing, J; Polity, A; Krämer, T; Hasselkamp, D; Meyer, BK; Hardt, M; Krost, A

Publication year2002

Pages4630-4634

JournalJapanese Journal of Applied Physics

Volume number41

Issue number7A

ISSN0021-4922

DOI Linkhttps://doi.org/10.1143/JJAP.41.4630

PublisherIOP Publishing


Abstract
Cu2S thin films were deposited on float glass substrates by radio frequency reactive sputtering. X-ray diffraction measurements, including grazing incidence geometry, showed that the sputtered Cu2S films had hexagonal structure with a strong (001) fiber texture. The thickness, surface density and roughness of the sputtered layers were characterized by X-ray reflectivity. Scanning electron microscopy from both top view and cross section revealed good morphology and uniform microstructure of the sputtered films. Rutherford backscattering spectroscopy and energy dispersive X-ray analysis were used to examine the composition of the films. By the optical transmission measurements, the indirect and direct band gaps of the films were estimated to be 1.19 and 1.82 eV, respectively.



Citation Styles

Harvard Citation styleHe, Y., Kriegseis, W., Bläsing, J., Polity, A., Krämer, T., Hasselkamp, D., et al. (2002) (001)-textured Cu2S thin films deposited by RF reactive sputtering, Japanese Journal of Applied Physics, 41(7A), pp. 4630-4634. https://doi.org/10.1143/JJAP.41.4630

APA Citation styleHe, Y., Kriegseis, W., Bläsing, J., Polity, A., Krämer, T., Hasselkamp, D., Meyer, B., Hardt, M., & Krost, A. (2002). (001)-textured Cu2S thin films deposited by RF reactive sputtering. Japanese Journal of Applied Physics. 41(7A), 4630-4634. https://doi.org/10.1143/JJAP.41.4630



Keywords


Cu2SCUXSGIXRDRE reactive sputteringtexture structure

Last updated on 2025-02-04 at 04:22