Journal article

Publication year: 2002

Pages: 226-231

Journal: Thin Solid Films

Volume number: 402

Issue number: 1-2

ISSN: 0040-6090

DOI Link: https://doi.org/10.1016/S0040-6090(01)01603-0

Publisher: Elsevier

Abstract: 
Fluorine- and tungsten-doped vanadium dioxide (VO2) is a promising coating material for applications as energy-conserving windows. We prepared VO2 films simultaneously co-doped with fluorine and tungsten and report on the results of optical measurements and photoelectron spectrometry. A comparison is given to single-element doping. Clear evidence for an interaction of fluorine and tungsten in VO2 is found in the switching behaviour at the semiconductor-to-metal phase transition. An explanation is given based on two different effects of fluorine incorporation observed in the ultraviolet photoelectron spectrometry results. Concerning other film properties, the two elements act independently of each other. (C) 2002 Elsevier Science B.V All rights reserved.

Harvard Citation style: Burkhardt, W., Christmann, T., Franke, S., Kriegseis, W., Meister, D., Meyer, B., et al. (2002) Tungsten and fluorine co-doping of VO₂ films, Thin Solid Films, 402(1-2), pp. 226-231. https://doi.org/10.1016/S0040-6090(01)01603-0

APA Citation style: Burkhardt, W., Christmann, T., Franke, S., Kriegseis, W., Meister, D., Meyer, B., Niessner, W., Schalch, D., & Scharmann, A. (2002). Tungsten and fluorine co-doping of VO₂ films. Thin Solid Films. 402(1-2), 226-231. https://doi.org/10.1016/S0040-6090(01)01603-0