Journal article
Authors list: Burkhardt, W; Christmann, T; Meyer, BK; Niessner, W; Schalch, D; Scharmann, A
Publication year: 1999
Pages: 229-235
Journal: Thin Solid Films
Volume number: 345
Issue number: 2
ISSN: 0040-6090
DOI Link: https://doi.org/10.1016/S0040-6090(98)01406-0
Publisher: Elsevier
Abstract:
Thermochromic tungsten- and fluorine-doped vanadium dioxide films, which are in discussion as intelligent window coatings, were deposited by reactive sputtering. Results of optical measurements and photoelectron spectrometry (XPS, UPS) at low doping levels (less than or equal to 2.6%) are presented, and together with structural properties they can be well correlated. By applying antireflective coatings the transmittance of films in the visible spectral range may be enhanced to more than 60% with fairly good switching characteristics at room temperature in the case of tungsten doping. (C) 1999 Published by Elsevier Science Ltd. All rights reserved.
Citation Styles
Harvard Citation style: Burkhardt, W., Christmann, T., Meyer, B., Niessner, W., Schalch, D. and Scharmann, A. (1999) W- and F-doped VO2 films studied by photoelectron spectrometry, Thin Solid Films, 345(2), pp. 229-235. https://doi.org/10.1016/S0040-6090(98)01406-0
APA Citation style: Burkhardt, W., Christmann, T., Meyer, B., Niessner, W., Schalch, D., & Scharmann, A. (1999). W- and F-doped VO2 films studied by photoelectron spectrometry. Thin Solid Films. 345(2), 229-235. https://doi.org/10.1016/S0040-6090(98)01406-0
Keywords
optical coatings; photoelectron spectrometry; vanadium dioxide