Journal article

W- and F-doped VO2 films studied by photoelectron spectrometry


Authors listBurkhardt, W; Christmann, T; Meyer, BK; Niessner, W; Schalch, D; Scharmann, A

Publication year1999

Pages229-235

JournalThin Solid Films

Volume number345

Issue number2

ISSN0040-6090

DOI Linkhttps://doi.org/10.1016/S0040-6090(98)01406-0

PublisherElsevier


Abstract
Thermochromic tungsten- and fluorine-doped vanadium dioxide films, which are in discussion as intelligent window coatings, were deposited by reactive sputtering. Results of optical measurements and photoelectron spectrometry (XPS, UPS) at low doping levels (less than or equal to 2.6%) are presented, and together with structural properties they can be well correlated. By applying antireflective coatings the transmittance of films in the visible spectral range may be enhanced to more than 60% with fairly good switching characteristics at room temperature in the case of tungsten doping. (C) 1999 Published by Elsevier Science Ltd. All rights reserved.



Citation Styles

Harvard Citation styleBurkhardt, W., Christmann, T., Meyer, B., Niessner, W., Schalch, D. and Scharmann, A. (1999) W- and F-doped VO2 films studied by photoelectron spectrometry, Thin Solid Films, 345(2), pp. 229-235. https://doi.org/10.1016/S0040-6090(98)01406-0

APA Citation styleBurkhardt, W., Christmann, T., Meyer, B., Niessner, W., Schalch, D., & Scharmann, A. (1999). W- and F-doped VO2 films studied by photoelectron spectrometry. Thin Solid Films. 345(2), 229-235. https://doi.org/10.1016/S0040-6090(98)01406-0



Keywords


optical coatingsphotoelectron spectrometryvanadium dioxide

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