Journal article

Chemical diffusion of copper in lead telluride


Authors listSchneider, C; Schichtel, P; Mogwitz, B; Rohnke, M; Janek, J

Publication year2017

Pages119-125

JournalSolid State Ionics

Volume number303

ISSN0167-2738

DOI Linkhttps://doi.org/10.1016/j.ssi.2017.02.012

PublisherElsevier


Abstract
Within thermoelectric generators, the chemical diffusion of a contact
material into the active thermoelectric material is a potential cause
for degradation, which has rarely been discussed in literature.
Frequently, this degradation phenomenon leads to major problems in
developing new modules and achieving long-term stability. In this study,
copper as one of the standard contact materials and lead telluride as
the state-of-the-art active material in the mid-temperature range are
investigated. Chemical diffusion experiments of copper in lead telluride
were carried out between 375 K and 795 K and the copper diffusion
profiles were obtained by Secondary Ion Mass Spectrometry (SIMS). The
evaluated chemical diffusion coefficient is lower than 10−13 cm2/s in the respective temperature range.




Citation Styles

Harvard Citation styleSchneider, C., Schichtel, P., Mogwitz, B., Rohnke, M. and Janek, J. (2017) Chemical diffusion of copper in lead telluride, Solid State Ionics, 303, pp. 119-125. https://doi.org/10.1016/j.ssi.2017.02.012

APA Citation styleSchneider, C., Schichtel, P., Mogwitz, B., Rohnke, M., & Janek, J. (2017). Chemical diffusion of copper in lead telluride. Solid State Ionics. 303, 119-125. https://doi.org/10.1016/j.ssi.2017.02.012


Last updated on 2025-21-05 at 13:13