Journal article
Authors list: Bludau, H; Wu, K; Zei, MS; Eiswirth, M; Over, H; Ertl, G
Publication year: 1998
Pages: 786-789
Journal: Surface Science
Volume number: 402-404
DOI Link: https://doi.org/10.1016/S0039-6028(97)01061-3
Publisher: Elsevier
The underpotential deposition (UPD) of copper on to Pt(111) in the presence of chloride anions was studied by full-dynamical LEED-intensity analyses. A deformed (4×4) LEED pattern was observed at an emersion potential of 0.36 V vs. Ag/AgCl, right in between the two characteristic and well-separated peaks of the cyclic voltammogram (CV). Corresponding LEED intensity measurements and simulations of the integral-order beams indicate that the UPD of Cu forms a single pseudomorphic Cu layer on Pt(111).
Abstract:
Citation Styles
Harvard Citation style: Bludau, H., Wu, K., Zei, M., Eiswirth, M., Over, H. and Ertl, G. (1998) The structure of the underpotential deposition of copper on to Pt(111) in the presence of chloride anions: a LEED structure analysis, Surface Science, 402-404, pp. 786-789. https://doi.org/10.1016/S0039-6028(97)01061-3
APA Citation style: Bludau, H., Wu, K., Zei, M., Eiswirth, M., Over, H., & Ertl, G. (1998). The structure of the underpotential deposition of copper on to Pt(111) in the presence of chloride anions: a LEED structure analysis. Surface Science. 402-404, 786-789. https://doi.org/10.1016/S0039-6028(97)01061-3