Journalartikel
Autorenliste: Valov, I; De Souza, RA; Wang, CZ; Börger, A; Korte, C; Martin, M; Becker, KD; Janek, J
Jahr der Veröffentlichung: 2007
Seiten: 1931-1941
Zeitschrift: Journal of Materials Science
Bandnummer: 42
Heftnummer: 6
ISSN: 0022-2461
eISSN: 1573-4803
DOI Link: https://doi.org/10.1007/s10853-006-0174-9
Verlag: Springer
Abstract:
The pulsed laser deposition technique was applied to deposit nitrogen-doped yttria stabilized zirconia (YSZ) thin films. The working parameters were varied in order to achieve a maximal nitrogen content. The films were characterized by SIMS, XPS, X-ray diffraction and optical spectroscopy. The surface topography was studied by AFM and HRSEM. The influence of the deposition parameters on the film properties is discussed.
Zitierstile
Harvard-Zitierstil: Valov, I., De Souza, R., Wang, C., Börger, A., Korte, C., Martin, M., et al. (2007) Preparation of nitrogen-doped YSZ thin films by pulsed laser deposition and their characterization, Journal of Materials Science, 42(6), pp. 1931-1941. https://doi.org/10.1007/s10853-006-0174-9
APA-Zitierstil: Valov, I., De Souza, R., Wang, C., Börger, A., Korte, C., Martin, M., Becker, K., & Janek, J. (2007). Preparation of nitrogen-doped YSZ thin films by pulsed laser deposition and their characterization. Journal of Materials Science. 42(6), 1931-1941. https://doi.org/10.1007/s10853-006-0174-9