Journalartikel

Preparation of nitrogen-doped YSZ thin films by pulsed laser deposition and their characterization


AutorenlisteValov, I; De Souza, RA; Wang, CZ; Börger, A; Korte, C; Martin, M; Becker, KD; Janek, J

Jahr der Veröffentlichung2007

Seiten1931-1941

ZeitschriftJournal of Materials Science

Bandnummer42

Heftnummer6

ISSN0022-2461

eISSN1573-4803

DOI Linkhttps://doi.org/10.1007/s10853-006-0174-9

VerlagSpringer


Abstract
The pulsed laser deposition technique was applied to deposit nitrogen-doped yttria stabilized zirconia (YSZ) thin films. The working parameters were varied in order to achieve a maximal nitrogen content. The films were characterized by SIMS, XPS, X-ray diffraction and optical spectroscopy. The surface topography was studied by AFM and HRSEM. The influence of the deposition parameters on the film properties is discussed.



Autoren/Herausgeber




Zitierstile

Harvard-ZitierstilValov, I., De Souza, R., Wang, C., Börger, A., Korte, C., Martin, M., et al. (2007) Preparation of nitrogen-doped YSZ thin films by pulsed laser deposition and their characterization, Journal of Materials Science, 42(6), pp. 1931-1941. https://doi.org/10.1007/s10853-006-0174-9

APA-ZitierstilValov, I., De Souza, R., Wang, C., Börger, A., Korte, C., Martin, M., Becker, K., & Janek, J. (2007). Preparation of nitrogen-doped YSZ thin films by pulsed laser deposition and their characterization. Journal of Materials Science. 42(6), 1931-1941. https://doi.org/10.1007/s10853-006-0174-9


Zuletzt aktualisiert 2025-21-05 um 15:36