Journal article

Preparation of nitrogen-doped YSZ thin films by pulsed laser deposition and their characterization


Authors listValov, I; De Souza, RA; Wang, CZ; Börger, A; Korte, C; Martin, M; Becker, KD; Janek, J

Publication year2007

Pages1931-1941

JournalJournal of Materials Science

Volume number42

Issue number6

ISSN0022-2461

eISSN1573-4803

DOI Linkhttps://doi.org/10.1007/s10853-006-0174-9

PublisherSpringer


Abstract
The pulsed laser deposition technique was applied to deposit nitrogen-doped yttria stabilized zirconia (YSZ) thin films. The working parameters were varied in order to achieve a maximal nitrogen content. The films were characterized by SIMS, XPS, X-ray diffraction and optical spectroscopy. The surface topography was studied by AFM and HRSEM. The influence of the deposition parameters on the film properties is discussed.



Citation Styles

Harvard Citation styleValov, I., De Souza, R., Wang, C., Börger, A., Korte, C., Martin, M., et al. (2007) Preparation of nitrogen-doped YSZ thin films by pulsed laser deposition and their characterization, Journal of Materials Science, 42(6), pp. 1931-1941. https://doi.org/10.1007/s10853-006-0174-9

APA Citation styleValov, I., De Souza, R., Wang, C., Börger, A., Korte, C., Martin, M., Becker, K., & Janek, J. (2007). Preparation of nitrogen-doped YSZ thin films by pulsed laser deposition and their characterization. Journal of Materials Science. 42(6), 1931-1941. https://doi.org/10.1007/s10853-006-0174-9


Last updated on 2025-21-05 at 15:36