Journalartikel

Non-destructive analysis of silver selenide films obtained by Pulsed Laser Deposition (PLD) with Micro-XRF


AutorenlisteDargel, R; Azeroual, M; Mogwitz, B; Janek, J; Vogt, C

Jahr der Veröffentlichung2007

Seiten7375-7380

ZeitschriftJournal of Materials Science

Bandnummer42

Heftnummer17

ISSN0022-2461

eISSN1573-4803

DOI Linkhttps://doi.org/10.1007/s10853-006-1310-2

VerlagSpringer


Abstract
Thin films of silver selenide with varying composition have been deposited on magnesium oxide substrates with pulsed laser deposition and were investigated via micro-XRF. A calibration procedure was designed to determine the absolute thicknesses of the films. The lateral homogeneity was investigated by elemental mapping, thus delivering information about the deposition process. Wet chemical analysis was performed on the dissolved layers with ICP-OES and ICP-MS to determine the stoichiometry of the Ag (x) Se (y) . The results suggest a correlation between the composition of the layers and their thicknesses by showing a silver enrichment for thinner layers.



Autoren/Herausgeber




Zitierstile

Harvard-ZitierstilDargel, R., Azeroual, M., Mogwitz, B., Janek, J. and Vogt, C. (2007) Non-destructive analysis of silver selenide films obtained by Pulsed Laser Deposition (PLD) with Micro-XRF, Journal of Materials Science, 42(17), pp. 7375-7380. https://doi.org/10.1007/s10853-006-1310-2

APA-ZitierstilDargel, R., Azeroual, M., Mogwitz, B., Janek, J., & Vogt, C. (2007). Non-destructive analysis of silver selenide films obtained by Pulsed Laser Deposition (PLD) with Micro-XRF. Journal of Materials Science. 42(17), 7375-7380. https://doi.org/10.1007/s10853-006-1310-2


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