Journalartikel

Jahr der Veröffentlichung: 2005

Seiten: 479-484

Zeitschrift: Defect and Diffusion Forum

Bandnummer: 237-240

ISSN: 1012-0386

ISBN: 3-908451-07-8

DOI Link: https://doi.org/10.4028/www.scientific.net/DDF.237-240.479

Verlag: Trans Tech Publications

Abstract: 
Anion diffusion in yttrium doped zirconium oxonitrides was investigated using the rare stable tracer (15)N. The tracer was deposited onto the samples using pulsed laser deposition of zirconia in a (15)N(2)-containing atmosphere. Diffusion anneals were performed in vacuum, and the depth distribution of the tracer was investigated using secondary ion mass spectroscopy. The observed nitrogen diffusivities are slightly higher than the ones obtained previously using samples with implanted nitrogen. The activation energy of nitrogen diffusion is above 2 eV.

Harvard-Zitierstil: Taylor, M., Kilo, M., Argirusis, C., Borchardt, G., Valov, I., Korte, C., et al. (2005) Nitrogen tracer diffusion in yttria doped zirconium oxonitride, Defect and Diffusion Forum, 237-240, pp. 479-484. https://doi.org/10.4028/www.scientific.net/DDF.237-240.479

APA-Zitierstil: Taylor, M., Kilo, M., Argirusis, C., Borchardt, G., Valov, I., Korte, C., Janek, J., Rödel, T., & Lerch, M. (2005). Nitrogen tracer diffusion in yttria doped zirconium oxonitride. Defect and Diffusion Forum. 237-240, 479-484. https://doi.org/10.4028/www.scientific.net/DDF.237-240.479