Journalartikel
Autorenliste: Vehseto, Mark; Seitz, Hermann
Jahr der Veröffentlichung: 2014
Seiten: 2161-2166
Zeitschrift: International Journal of Precision Engineering and Manufacturing
Bandnummer: 15
Heftnummer: 10
ISSN: 2234-7593
eISSN: 2005-4602
DOI Link: https://doi.org/10.1007/s12541-04-0577-5
Verlag: Springer
Abstract:
In this study, a compact diode laser based Micro Stereolithography (Dtc - Diode Laser Curing) system with linear stages has been developed. A suspended cross table was used to position a diode laser with a focusing lens that cures liquid photosensitive resin. Therefore the apparatus does not need complex beam forming and beam guiding, e.g., galvanometer scanner, optic fibers or similar Only one replaceable focusing lens is needed A commercial photo-curable resin was adapted by UV-absorber for p-SLA. To demonstrate the functionality Single-lines were cured with different parameters such as laser power; scan speed and absorber concentration. Afterwards, specimen with simple geometries like edges and circles were cured Thereby the limitations of roundness and sharp geometries were determined Finally, 3D-parts are built with optimized curing parameters. The results show that the new Micro-Stereolithography-System, based on diode laser and fast linear stages is suitable for an effective fabrication of 3D micro-parts.
Zitierstile
Harvard-Zitierstil: Vehseto, M. and Seitz, H. (2014) A New Micro-Stereolithography-System based on Diode Laser Curing (DLC), International Journal of Precision Engineering and Manufacturing, 15(10), pp. 2161-2166. https://doi.org/10.1007/s12541-04-0577-5
APA-Zitierstil: Vehseto, M., & Seitz, H. (2014). A New Micro-Stereolithography-System based on Diode Laser Curing (DLC). International Journal of Precision Engineering and Manufacturing. 15(10), 2161-2166. https://doi.org/10.1007/s12541-04-0577-5
Schlagwörter
Curing; Diode laser; DYNAMIC MASK; Linear stages; Micro stereolithography; MICROSTEREOLITHOGRAPHY