Journalartikel

Jahr der Veröffentlichung: 2002

Seiten: 4630-4634

Zeitschrift: Japanese Journal of Applied Physics

Bandnummer: 41

Heftnummer: 7A

ISSN: 0021-4922

DOI Link: https://doi.org/10.1143/JJAP.41.4630

Verlag: IOP Publishing

Abstract: 
Cu2S thin films were deposited on float glass substrates by radio frequency reactive sputtering. X-ray diffraction measurements, including grazing incidence geometry, showed that the sputtered Cu2S films had hexagonal structure with a strong (001) fiber texture. The thickness, surface density and roughness of the sputtered layers were characterized by X-ray reflectivity. Scanning electron microscopy from both top view and cross section revealed good morphology and uniform microstructure of the sputtered films. Rutherford backscattering spectroscopy and energy dispersive X-ray analysis were used to examine the composition of the films. By the optical transmission measurements, the indirect and direct band gaps of the films were estimated to be 1.19 and 1.82 eV, respectively.

Harvard-Zitierstil: He, Y., Kriegseis, W., Bläsing, J., Polity, A., Krämer, T., Hasselkamp, D., et al. (2002) (001)-textured Cu₂S thin films deposited by RF reactive sputtering, Japanese Journal of Applied Physics, 41(7A), pp. 4630-4634. https://doi.org/10.1143/JJAP.41.4630

APA-Zitierstil: He, Y., Kriegseis, W., Bläsing, J., Polity, A., Krämer, T., Hasselkamp, D., Meyer, B., Hardt, M., & Krost, A. (2002). (001)-textured Cu₂S thin films deposited by RF reactive sputtering. Japanese Journal of Applied Physics. 41(7A), 4630-4634. https://doi.org/10.1143/JJAP.41.4630