Journalartikel

Jahr der Veröffentlichung: 1999

Seiten: 229-235

Zeitschrift: Thin Solid Films

Bandnummer: 345

Heftnummer: 2

ISSN: 0040-6090

DOI Link: https://doi.org/10.1016/S0040-6090(98)01406-0

Verlag: Elsevier

Abstract: 
Thermochromic tungsten- and fluorine-doped vanadium dioxide films, which are in discussion as intelligent window coatings, were deposited by reactive sputtering. Results of optical measurements and photoelectron spectrometry (XPS, UPS) at low doping levels (less than or equal to 2.6%) are presented, and together with structural properties they can be well correlated. By applying antireflective coatings the transmittance of films in the visible spectral range may be enhanced to more than 60% with fairly good switching characteristics at room temperature in the case of tungsten doping. (C) 1999 Published by Elsevier Science Ltd. All rights reserved.

Harvard-Zitierstil: Burkhardt, W., Christmann, T., Meyer, B., Niessner, W., Schalch, D. and Scharmann, A. (1999) W- and F-doped VO₂ films studied by photoelectron spectrometry, Thin Solid Films, 345(2), pp. 229-235. https://doi.org/10.1016/S0040-6090(98)01406-0

APA-Zitierstil: Burkhardt, W., Christmann, T., Meyer, B., Niessner, W., Schalch, D., & Scharmann, A. (1999). W- and F-doped VO₂ films studied by photoelectron spectrometry. Thin Solid Films. 345(2), 229-235. https://doi.org/10.1016/S0040-6090(98)01406-0